Aluminum Sputtering Targets

Al, 99 – 99.999% pure

Applications: Sputtering of Aluminum is used to produce reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuit, display, and etc.

When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

                                       Technical Specifications:

Molecular Weight                              26.98

Appearance                                        Metallic, Silvery in Color

Melting Point                                      660.37^oC

Boiling Point                                        2467^oC

Density                                                 2.699 gm/cm³

Coefficient of Thermal Expansion   23.1 x 10^-6/K (25^oC)

Thermal Conductivity                        235 W/m.K

Vickers Hardness                                167 MPa

Sputter                                                  DC

Z Ratio                                                   1.08

Bond Type                                            Indium, Elastomer

                                                      Aluminum Sputtering Targets are available in diameters from 1.00 inch up to 12.00 inch with

                                                      thickness from 1 mm to 6.35 mm (0.250”).