Hafnium Dioxide

HfO₂

Form:

This material is supplied in a compact form as tablets and powder with the content of some admixtures from n. 10^-3 to n. 10^-4 mass %.

Applications:

It is used for multi-layer interference, achromatic beam splitting, protective dielectrical and CVD coatings from UV to medium IR region of the spectrum 0.25 - 8 mkm with the refractive index 1.95 for wavelength 0.5 mkm possessing high chemical and mechanical stability's, low absorption and diffusion of light.

Typical Analysis:

HfO₂                  99.996%                                   

Al           5 ppm                      Ni             < 1 ppm

Cr        < 2                               Pb            < 2

Cu          1                               Si                 6

Fe          6                               Ti              < 3

Mg      < 5                               V                 0.5

Mn      < 0.5                            Zr             < 0.07%

Opto-physical Properties:

Density:                                 9.68 gm/cc

Refractive Index:                  1.95 mkm

Transparency Range:         0.25 - 8 mkm

Melting Point:                 780^oC