Open here for our page navigation
Yttrium Fluoride
YF3
99.995% pure
Form: This material is supplied in a compact form as tablets. Yttrium Fluoride is made via the DF method. It contains very little oxygen, chlorine and will show almost no spitting and out-gassing.
Applications: Yttrium Fluoride films can be deposited by resistance-heated or e-beam evaporation. The film density and refractive index increases with the temperature of the substrate. Amorphous films exhibiting low scatter can be deposited below 150oC substrate temperature but at that point the adhesion and refractive indexes can be compromised. Above about 250oC, the films become harder and more crystalline, while exhibiting noticeable scatter and more stress. High substrate temperature and e-beam depositions reduce the depth of water absorption bands at 3 microns and 5.5 - 7.5 microns.
Yttrium Fluoride yields low index film layers that exhibit good transparency and show low stress. They make YF3 an extremely suitable alternative to ThF4 in IR applications.
Typical Analysis:
Al < 1 ppm Mo < 1 ppm
Co < 2 Ni < 2
Cr < 2 Pb < 1
Cu < 0.5 Si < 1
Fe 0.8 Ti < 1
Mn < 2 V < 1
Optical Properties:
Transparency Range: 200 nm - 14000 nm Solubility Insoluble In H2O
Refractive Index: 1.55 at 220 nm Density: 5.07 gm/cc
1.51 at 500 nm Melting Point: 2687oC
1.3 - 1.4 at 1000 nm
Evaporation Temperature: 1100oC Pressure: < 1 x 10-5 mbar
Substrate Temperature: 100 - 150oC Deposition Rate: 1.5 nm/sec