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Boron Sputter Target
99 – 99.99% pure
Boron is a non-metallic element and the only non-metal of group 13 of the periodic table the elements.
Boron is electron-deficient, possessing a vacant p-orbital. It has several forms, the most common of which is amorphous boron, a dark powder, unreactive to oxygen, water, acids and alkalis. It reacts with metals to form borides.
At standard temperatures boron is a poor electrical conductor but is a good conductor at high temperatures.
Applications: Boron Sputtering Targets are used in the manufacture of Electronics, Semiconductors and Flat panel displays.
Physical Parameters:
Symbol B
Atomic Number 5
CAS# 7740-42-8
Atomic Mass 10.811 amu
Density 2.34 gm/cm3
Melting Point 2300oC / 4172oF
Boiling Point 2550oC / 4622oF
Appearance Black, Semi-metallic
Specifications:
Material Boron Sputtering Target
Electrical Resistivity 4 x 106 μΩ-cm
Mohs Hardness 9.3 @ 20oC
Thermal Conductivity 27 W/m.K
Z Ratio 0.389
Sputter Method RF
Maximum Power Density 20 W/in2
Types of Bonding Elastomer, Indium
Note: Boron Targets may explode with rapid cooling, care should be taken.